Semiconductor manufacturing is a process with extremely high environmental requirements, and strict temperature control determines the performance of the product. Semiconductor chillers are commonly used in semiconductor industry packaging and testing processes, semiconductor FAB process temperature control, cooling of CMOS/CCD sensors in semiconductor metrology systems, circulating cooling of semiconductor metrology AOI systems, providing independent temperature control for cavity side walls, plasma bevel etching and deposition, thermal atomic layer etching of metal tungsten, etc.
Variable frequency pump can adjust the circulating liquid pressure and flow rate. The output pressure and flow rate of the circulating liquid can be set on the operation panel.
Different testing requirements for in Semiconductor Industries:
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Aging test equipment: The matching thermal drying system provides cooling and heating
temperature,
improves the test efficiency and quality of wafer chips, and has small temperature accuracy error.
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Chip Testing Equipment: The thermal chiller is matched with the test machine, with a
temperature control
accuracy of ±0.05℃, which improves the chip testing efficiency of the institute.
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Semiconductor Fab: The process chiller is used in semiconductor fabs, with high-precision
cooling and
heating temperature control, which improves the manufacturing rate of wafers and reduces the scrap rate.
Overview:
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Working Temperature Range: -120degC to +300degC
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FLTZ Multichannel: Has Multichannel Independent Temperature control – it can have separate
temperature
range, cooling and heating capacity, thermal conductivity medium flow rate, etc. According to the required
temperature ranges, steam compression refrigeration or ETCU non compressor heat exchange system can be
selected.
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ZLTZ Series: Suitable for temperature control applications such as microchannel reactors,
plate heat
exchangers, cold plates, heat sink plates and tubular reactors with small heat exchange areas, large
refrigeration capacities and small temperature differences. The equipment can automatically recycle the
thermal conductive medium.
The ZLTZ temperature control unit is combined with a microchannel reactor to form a high heat release
temperature control application. Under the same flow condition, the heat transfer efficiency of the
temperature control is more than 5 times that of the heat transfer oil. At the same time, the temperature
difference between the inlet and outlet is small, and the temperature filed uniformity is high, which is
particularly suitable for applications with intense heat release reactions. These units are in combination
with cold plate and heat sink plate for high heat absorption and high uniformity temperature control.
The ZLTZ temperature control unit is combined with ESC chucks, vacuum chucks, etc to achieve a temp control
range of -65 to 200degC. At the same time, one ZLTZ TCU with multiple ESC chucks can control different
temperatures.
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LQ Series: These models use non corrosive gas as a cooling medium such as dry compressed
air, nitrogen,
argon and other normal temperature gas. The gas can reach the targeted low temperature, supply the demanded
test components or heat exchangers.
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AI Series: Suitable models are also used in low and high temperature testing of
semiconductor equipment.
Electronic equipment high temperature and low temperature thermostat testing cold and heat sources. They can
work for continuously long time, automatic defrost and it will also not affect the storage temperature
during defrosting. Does no affect the Evaporation process during defrosting.
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AES Series: These Series have jet flow high and low temperature impact tester provides
precise and rapid
ambient temperature for chips, modules, integrated circuit boards, electronic components, etc. It is an
indispensable instrument for electrical performance test, failure analysis and reliability evaluation of
products.
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AET Series: In these models the compressed air enters the gas rapid temperature change
testing machine,
which is equipped with a dryer. The gas is pre dried to a dew point temperature of -70degC or below and then
cooled, heated and controlled to output stable flow, pressure and constant temperature gas. The temperature
of the target object is controlled (various temp control chucks, chamber environments, heat support plates,
material shuttles, chambers, electronic components, etc) and the temperature of the process can be
controlled according to the temperature sensor on the remote chuck and then the temperature of the output
gas can be automatically adjusted.
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Rapid Temp Change temp control Chuck: This product enables rapid temp changes and precise
temp control. The system itself comes with a chiller to avoid the consumption of liquid nitrogen, carbon
dioxide, etc. Each system contains a chuck and a cold and heat control unit.
The system provides an open flat surface working platform, rapid rise and fall, constant temperature
control, used in RF devices and high-density power device testing (IGBTs and MOSFETSs), can also be used in
laboratory flat plate rapid cooling (Plasma, biological products, batteries), etc.
The direct refrigerant evaporation method is used inside the plate, which greatly improves the heat transfer
efficiency and improves the heat transfer power per unit area of the plate compared with the liquid cooling
method.
FLTZ Multi Channel |
Model |
FLTZ-203W-2T |
Pipeline |
Channel 1 |
Channel 2 |
Temp Range |
-20°C to +90°C |
-20°C to +90°C |
Temp Control accuracy |
±0.1°C |
±0.1°C |
Cooling capacity |
4kW @ -10°C |
4kW @ -10°C |
Heating capacity |
2kW |
2kW |
Heat conducting medium flow rate |
20L/min @ 0.5MPa |
20L/min @ 0.5MPa |
Heat conducting medium connection size |
ZG3/4 |
ZG3/4 |
Ambient Temperature |
10 – 35 °C |
10 – 35 °C |
Ambient humidity |
30 – 70% |
30 – 70% |
Cooling water temperature |
15 – 20 °C |
15 – 20 °C |
Cooling water flow rate |
20L/min |
20L/min |
Weight |
400Kg |
Circuit Breaker |
30A |
Process temperature Control |
The remote target temperature can be controlled by combining the self created model free
self built tree algorithm and cascade algorithm |
Dimension cm |
50*90*160 |
FLTZ Multi Channel |
Model |
FLTZ-203W-2T |
Pipeline |
Channel 1 |
Channel 2 |
Temp Range |
-45°C to +40°C |
+10°C to +80°C |
Temp Control accuracy |
±0.1°C |
±0.1°C |
Cooling capacity |
11kW @ -20°C 5kW @ -40°C |
13kW @ +10°C |
Heating capacity |
2kW |
6kW |
Heat conducting medium flow rate |
17L/min @ 0.7MPa |
17L/min @ 0.7MPa |
Heat conducting medium connection size |
ZG3/4 |
ZG3/4 |
Ambient Temperature |
10 – 35 °C |
10 – 35 °C |
Ambient humidity |
30 – 70% |
30 – 70% |
Cooling water temperature |
15 – 20 °C |
15 – 20 °C |
Cooling water flow rate |
40L/min |
20L/min |
Weight |
400Kg |
Circuit Breaker |
80A |
Process temperature Control |
The remote target temperature can be controlled by combining the self created model free
self built tree algorithm and cascade algorithm |
Dimension cm |
60*100*185 |
FLTZ Multi Channel |
Model |
FLTZ-203W/ETCU-008W |
Pipeline |
Channel 1 |
Channel 2 |
Channel 3 |
Temp Range |
-10°C to +60°C |
+30°C to +80°C |
-10°C to +80°C |
Temp Control accuracy |
±0.1°C |
±0.1°C |
±0.1°C |
Cooling capacity |
4kW @ -10°C 21kW @ +20°C |
6kW @ +30°C |
3kW @ -10°C |
Heating capacity |
4kW |
4.5+6kW |
3kW |
Heat conducting medium flow rate |
17L/min @ 0.7MPa |
17L/min @ 0.7MPa |
17L/min @ 0.7MPa |
Heat conducting medium connection size |
ZG3/4 |
ZG3/4 |
ZG3/5 |
Ambient Temperature |
10 – 35 °C |
10 – 35 °C |
10 – 35 °C |
Ambient humidity |
30 – 70% |
30 – 70% |
31 – 70% |
Cooling water temperature |
15 – 20 °C |
15 – 20 °C |
15 – 20 °C |
Cooling water flow rate |
30L/min @ 15-20 °C |
15L/min @ 15-20 °C |
15L/min @ 15-20 °C |
Weight |
600Kg |
Circuit Breaker |
100A |
Process temperature Control |
The remote target temperature can be controlled by combining the self created model free
self built tree algorithm and cascade algorithm |
Dimension cm |
60*100*170 |
FLTZ Multi Channel |
Model |
FLTZ-215W/ETCU-015W/ETCU-008W |
Pipeline |
Channel 1 |
Channel 2 |
Channel 3 |
Temp Range |
-20°C to +50°C |
+30°C to +100°C |
+30°C to +40°C |
Temp Control accuracy |
±0.1°C |
±0.1°C |
±0.1°C |
Cooling capacity |
15kW @ -10°C |
13kW @ PCW +15°C |
8kW @ PCW +10°C |
Heating capacity |
2kW |
6kW |
Pump Heat Loss |
Heat conducting medium flow rate |
30L/min @ 0.85MPa |
30L/min @ 0.85MPa |
20L/min @ 0.8MPa |
Heat conducting medium connection size |
ZG3/4 |
ZG3/4 |
ZG3/5 |
Ambient Temperature |
10 – 35 °C |
10 – 35 °C |
10 – 35 °C |
Ambient humidity |
30 – 70% |
30 – 70% |
31 – 70% |
Cooling water temperature |
15 – 20 °C |
15 – 20 °C |
15 – 20 °C |
Cooling water flow rate |
30L/min @ 15-20 °C |
15L/min @ 15-20 °C |
15L/min @ 15-20 °C |
Weight |
600Kg |
Circuit Breaker |
75A |
Process temperature Control |
The remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm |
Dimension cm |
60*100*170 |
FLTZ Multichannel |
Model |
FLTZ-203W/2T dual system |
FLTZ-305W/2T dual system |
FLTZ-406W/2T dual system |
Temp Range |
-20°C to +90°C |
-30°C to +90°C |
-45°C to +90°C |
Temp Control accuracy |
±0.1°C |
Heat conducting medium flow rate |
15 – 45L/min; 6 bar max |
Cooling capacity |
3kW @ -15°C |
3kW @ -15°C |
5kW @ -15°C |
5kW @ -15°C |
2.5kW @ -35°C |
2.5kW @ -35°C |
Heating capacity |
2.5kW |
2.5kW |
2.5kW |
2.5kW |
3.5kW |
3.5kW |
Internal circulation fluid volume |
5L |
5L |
8L |
8L |
8L |
8L |
Expansion Tank Volume |
15L |
15L |
25L |
25L |
25L |
25L |
Heat Conducting medium |
Fluorinated liquid, antifreeze, thermal conductive silicone oil, etc |
Refrigerant |
R448 |
Heat Conducting Medium Interface |
ZG3/4 |
Cooling water interface |
ZG3/4 |
Cooling water |
50L/min at 20°C |
60L/min at 20°C |
50L/min at 20°C |
Power |
Three phase 220V / Three phase 400V / Three phase 460V |
Process Temperature Control |
The remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm |